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(해외학술논문)'Effect of reflector bias voltage on the nanocrystallization of silicon thin films by reactive particle beam assisted chemical vapor deposition'at RISS Linked Data

https://data.riss.kr/resource/ForeignArticle/57568699

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Property	Value
skos:prefLabel	Effect of reflector bias voltage on the nanocrystallization of silicon thin films by reactive particle beam assisted chemical vapor deposition
rdf:type	http://data.riss.kr/ontology/ForeignArticle
dc:title	Effect of reflector bias voltage on the nanocrystallization of silicon thin films by reactive particle beam assisted chemical vapor deposition
dbpprop:country	ja
dcterms:DDC	666
bibo:locator	http://www.riss.kr/link?id=O57568699
keris:page	922-925
keris:interval	m
dc:creator	Choi, S.G. Jang, J.-N. Hong, M. Kwon, K.-H. Park, H.-H.
dc:publisher	CERAMIC SOC OF JAPAN
keris:hasJournalOf	JOURNAL- CERAMIC SOCIETY JAPAN

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